C-4 stripper alkaline
Hydrogen Oxidation on PdIr/C Catalysts in Alkaline Media
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ENSTRIP AU-78M
A stripper for removing photoresist or solder masks has a composition of % is to provide an alkaline organic stripper having a high flash point (>° C.).
Description:A further discovery resides in the discovery that the photoresist strippers of this invention are able to satisfactorily strip hardened or cross-linked photoresist resins while producing substantially no undesirable metal corrosion. In a method of stripping highly cross-linked or hardened photoresist resin from a substrate with a photoresist stripping composition the improvement comprising using the alkaline-containing photoresist stripping composition of claim 1 as the photoresist stripping composition. In addition, a solder mask is exposed to heat after curing; e. As example of such solvents there may be mentioned, various pyrrolidinone compounds such as e. For example, one can substitute sodium hydroxide or quaternary ammonium hydroxide for potassium hydroxide and substitute 2-amino-ethanol for aminoethoxyethanol. It has been found that the amount of water in the stripper should be minimal, e. Another object of the invention is to provide an alkaline organic stripper that does not use solvents known to be toxic to human beings.
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